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RTP and RTCVD Ovens

http//:annealsys.com

 
Annealsys supplies RTP (Rapid Thermal Processing) Furnaces and RTCVD (Rapid Thermal Chemical Vapour Deposition) Furnaces with a focus on both research  and university work as well as the semi-conductor industry.

With dozens of years experience in this industry, Annealsys provides an innovative equipment set to meet the demands of cutting edge research and production. 

AS-Master  Rapid Thermal Processing Oven (up to 8")

bulletstainless steel cold wall chamber technology provides high process repeatability with ultraclean, contamination-free environment
bulletfast digital PID temperature controller
bulletboth pyrometer and thermocouple temperature measurement
bulletinnovative product
bulletinfrared tubular halogen lamp furnace
bulletfull PC control and recipes
bulletsmall footprint
bulletdesigned for RTA (Rapid Thermal Annealing)
bulletdesigned for RT0 (Rapid Thermal Oxidization)
bulletcompound semiconductor annealing
bulletnitridation, silicidation, crystallization, densification 

Key Benefits

bulletTemperature range from RT to 1400șC
bulletRamp rate up to 200șC/s
bulletGas mixing capabilities with mass flow controllers
bulletVacuum range : Atm to 10exp-6 Torr (with optional turbo pump)
bulletup to 5 process gases (optional)
bulletsquare chamber available (optional)
bulletProcesses scalable to Annealsys production tool

For more information contact us at sales@coltronics.com.au

 

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Copyright © 2007 Coltronics Systems Pty Ltd
Last modified: 06/05/09