"Solution provider for Rapid Thermal Processing Furnaces & Chemical Vapour Deposition Systems"

Annealsys supplies RTP (Rapid Thermal Processing) Furnaces, RTCVD (Rapid Thermal Chemical Vapour Deposition) Furnaces, MOCVD (Metal Oxide), Spray CVD and LPCVD (Low Pressure) with a focus on both research and university work as well as the semi-conductor industry.

With dozens of years experience in this industry, Annealsys provides innovative equipment set to meet the demands of cutting edge research and production.

Our Products

- AS-Series cold wall chamber furnaces for RTP and RTCVD Applications up to 1500ºC

- MC Series innovative solution for MOCVD and ALD (Atomic Layer Deposition applications with deposition and annealing inside the same chamber

- Spray Series 2-inch deposition and annealing for laboratories

- LC Series 4-inch low pressure furnace for samll production with single or dual tube furnaces

Key Benefits

  • Innovative Products
  • Easy to Clean and Maintain
  • Small footprint
  • Stainless Steel Design
  • Applicable Industries

  • University Electronics, Material Science, Renewable Energy Groups
  • Solar Industry Research and Development Departments